PSA Oxygen Generator (Pressure Swing Adsorption Oxygen Generator) is a key clean equipment in the semiconductor manufacturing
industry. Based on high-precision Pressure Swing Adsorption (PSA)
technology, it achieves deep purification through double-layer
molecular sieves (ordinary molecular sieves + high-purity molecular
sieves) to produce high-purity oxygen with a concentration of over
99.5%. It features core advantages such as stable purity, high
cleanliness, reliable operation, and zero pollutant emissions,
which can meet the stringent requirements for oxygen purity and
cleanliness in processes such as oxidation and thin film deposition
during semiconductor manufacturing. As the top-tier configuration
for psa oxygen plant purity, the impurities (nitrogen, moisture, carbon dioxide, etc.) in the
oxygen produced by this equipment are all controlled below the ppm
level, avoiding a decrease in chip yield caused by insufficient
oxygen purity. It is an indispensable core oxygen supply equipment
for semiconductor manufacturing.
Product Parameters
Output (Nm3/h) | Effective gas consumption ( Nm3/min ) | Air cleaning system | Inlet/outlet caliber(mm) |
5 | 0.78 | KJ-1 | DN25 | DN15 |
10 | 1.75 | KJ-2 | DN25 | DN15 |
20 | 3.55 | KJ-6 | DN40 | DN15 |
30 | 5.25 | KJ-6 | DN40 | DN25 |
40 | 7.0 | KJ-10 | DN50 | DN25 |
50 | 8.7 | KJ-10 | DN50 | DN25 |
60 | 10.5 | KJ-12 | DN50 | DN32 |
80 | 13.75 | KJ-20 | DN65 | DN40 |
100 | 16.64 | KJ-20 | DN65 | DN40 |
150 | 24.91 | KJ-30 | DN80 | DN40 |
200 | 33.37 | KJ-40 | DN100 | DN50 |
300 | 49.82 | KJ-60 | DN125 | DN50 |
Semiconductor manufacturing represents the pinnacle of precision
manufacturing, with chip processes having entered the nanometer
scale (5nm, 3nm). Any tiny impurities may cause chip short
circuits, performance degradation, or yield reduction. Oxygen is
mainly used in core processes such as oxidation (forming SiO₂
insulation layers) and Chemical Vapor Deposition (CVD) in
semiconductor manufacturing. Oxygen purity directly affects the
uniformity of insulation layer thickness, film adhesion, and chip
electrical performance.
Ordinary industrial-grade oxygen (93% purity) contains impurities
such as nitrogen and moisture that can form defects on the chip
surface, leading to a 10-20% decrease in yield; in contrast, 99.5%
high-purity oxygen can control impurity content below the ppm
level, effectively avoiding defect formation and ensuring chip
yield remains stable above 90%. The double-layer molecular sieve
adsorption technology of the PSA Oxygen Generator can deeply remove impurities such as nitrogen, moisture, and
carbon dioxide from the air. Its psa oxygen plant purity control precision far exceeds that of traditional oxygen
generation equipment, fully meeting the process requirements of
semiconductor manufacturing.
In addition, semiconductor manufacturing has extremely high
requirements for oxygen cleanliness. The output gas must meet Class
100 cleanroom classification (no more than 100 particles ≥0.5μm per
cubic foot of air). The PSA Oxygen Generator is equipped with a high-efficiency gas filtration system that can
filter tiny particles in oxygen, avoiding particle contamination on
the chip surface and further ensuring chip quality.
When purchasing PSA Oxygen Generator, semiconductor enterprises must adhere to four core principles:
"qualified purity, cleanroom compatibility, stability and
reliability, and complete supplier qualifications".
In terms of purity, it is imperative to select equipment with
oxygen purity ≥99.5% and impurity content meeting semiconductor
process requirements, and require suppliers to provide third-party
test reports (such as SGS, ITS);
In terms of cleanroom compatibility, it is necessary to confirm
that the output gas cleanliness of the equipment is ≥Class 100 and
the equipment casing meets cleanroom installation requirements; in
terms of stability and reliability, priority should be given to
products with continuous operation time ≥8,000 hours/year and
warranty for core components ≥3 years.
Supplier qualifications are crucial. It is necessary to select
enterprises with psa based oxygen plant production qualifications, ISO9001 quality management system
certification, and relevant semiconductor industry certifications
(such as SEMI certification), and require them to provide
successful cases in the semiconductor industry (such as cooperation
cases with chip manufacturing and semiconductor packaging and
testing enterprises). In addition, after-sales service must meet
the high requirements of the semiconductor industry. Suppliers
should be able to provide 24/7 technical support, regular on-site
maintenance, and rapid spare parts supply to ensure long-term
stable operation of the equipment.
With its 99.5% high-purity advantage, the PSA Oxygen Generator has become a benchmark for clean oxygen supply in semiconductor
manufacturing. Its precise purity control, clean gas output, and
stable operating performance can provide reliable oxygen supply
support for semiconductor processes, making it a key equipment for
chip manufacturing enterprises to improve yield and reduce costs.
In addition to PSA Oxygen Generators, we also produce VPSA Oxygen Generators, storage tanks, heat exchangers and other
products. If you are interested in VPSA Oxygen Systems or other
products, please feel free to send an email to info@gneeheatex.com. We will be very happy to serve you.
2025 VPSA PSA Oxygen Generator with 150Bar Filling Pressure 42Nm3/hr Output and 0.04-0.06Mpa Outlet Pressure
