Hwf6630-10 Type Tank Type Gas Phase Deposition Furnace For Experimental Purposes

The HWF6630-10 tank vapor deposition furnace is designed for medium-temperature heat treatment of electronic products. It supports vapor phase reaction processes in nitrogen, acetylene, and hydrogen atmospheres, as well as sintering processes under protective atmospheres. Equipped with a real-time computer monitoring system, this furnace is ideal for material process testing in research environments.

• Model: HWF6630-10
• Operating Temperature: 750°C
• Maximum Temperature: 1000°C
• Effective Chamber Size: Φ600×300mm (D×H)
• Heating Element: Internal heating with stainless steel heating tubes
• Processing Atmosphere: Nitrogen, Hydrogen, Acetylene
• Heating Method: FEC ceramic fiber heater
• Temperature Control Points: 2
• Temperature Stability: ±1°C, with PID parameter self-tuning function
• Control Method: Touch screen + PLC centralized control
• Alarm Protection: Audible and visual alarms for overtemperature and thermocouple breakage
• Heating Rate: ≤6°C/min
• Heating Power: 16kW
• Power Requirements: 3-phase 5-wire, 220/380V, 50Hz
• External Dimensions: 1185×1745×1780mm (W×H×D)

• Environmental Conditions: Temperature 0~40°C, humidity ≤80% RH, no corrosive gases
• Floor Requirements: Level, no significant vibration, load-bearing capacity >500 kg/m²
• Power Requirements: Capacity >22 kVA, 3-phase 5-wire, 220/380V, 50Hz
• Installation Space: 1500 mm × 1500 mm × 3000 mm (D × W × H)