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| Categories | XRF Analyzer | 
|---|---|
| Brand Name: | Lonroy | 
| Model Number: | AL-Y3500xrdf | 
| Certification: | ISO ASTM CE | 
| Place of Origin: | China | 
| MOQ: | 1 | 
| Price: | Negotaible | 
| Payment Terms: | L/C,D/A,D/P,T/T,Western Union | 
| Supply Ability: | 200 | 
| Delivery Time: | 5-8 work days | 
| Packaging Details: | Wooden package | 
| Rated Power: | 3kW | 
| Tube Voltage: | 10 - 60kV | 
| Stability: | ≤0.005% | 
| Warranty: | 1 Year | 
| Model: | AL-Y3500xrdf | 
| Overall Dimensions: | 1320*1000*1800mm | 
| Company Info. | 
| DONGGUAN LONROY EQUIPMENT CO LTD | 
| Verified Supplier | 
| View Contact Details | 
| Product List | 
The AL-Y3500xrdf instrument is a high-end analytical device that integrates X-ray diffraction technology (XRD) and X-ray spectroscopy technology (EDS). It is mainly used for the elemental composition analysis and structural characterization of materials. Through a single measurement, it can simultaneously obtain key information such as the elemental composition, crystal structure, phase composition, and grain size of the material. It is widely applied in fields such as materials science, geology, physics, chemistry, biology, semiconductor, catalyst characterization, metal matrix analysis, and nanotechnology.
Features:
1.Efficient integration: A single measurement can simultaneously
obtain diffraction and spectroscopy data, eliminating the
time-consuming and error-prone process of traditional step-by-step
measurements.
 2.High sensitivity and accuracy: Utilizing advanced detectors and
algorithms, the detection limit is as low as the ppm level, and the
structural resolution accuracy reaches the atomic level.
 3.Multi-functional expansion: Various functional accessories meet
the needs of different testing purposes. They support various
sample forms (powder, block, film, etc.), are compatible with
special environments such as high temperature, low temperature, and
high pressure, and are equipped with a high-stability X-ray
generator control system to achieve more stable repeat measurement
accuracy.
 4.Hardware integration: Sharing the X-ray source, sample stage and
control system to ensure the synchronization of the optical paths
and signal matching of the two technologies.
 5.Data fusion: Through dedicated software, the diffraction patterns
and spectral data are jointly analyzed. By integrating the crystal
structure information from X-ray diffraction (XRD) and the
elemental composition data from X-ray fluorescence spectroscopy
(XRF), the full-dimensional characterization of the substance is
achieved.
 6.Identification of one or more crystal phases in unknown samples
can be carried out simultaneously, and 40 elements can be analyzed
at the same time.
 7.Utilizing multiple collimators and solar slit system, it features
proprietary intellectual property technology.
 8.Crystal structure analysis (Rietveld structure analysis) is
carried out, including basic parameters, empirical coefficient
method, etc.
 9.Under unconventional conditions (such as high and low
temperatures), the crystal structure can change, and multiple
sample platforms can be accommodated.
10.Analysis of thin film samples, including the crystal phase of
the film, the thickness of multilayer films, surface roughness, and
charge density.
 11.Analysis of micro-area samples, metal material texture, and
stress analysis.
Technical Parameter
| Rated Power | 3kW (high - frequency high - voltage control technology) | 
| Tube Voltage | 10 - 60kV | 
| Tube Current | 5 - 50mA | 
| X - ray Tube | Metal ceramic tube, materials: Cu, Fe, Co, Cr, Mo, etc., power: 2.4kW | 
| Focal Spot Size | 1×10mm, 0.4×14mm, 2×12mm | 
| Stability | ≤0.005% | 
| Element Detection Range | Na (Sodium) ~ U (Uranium) | 
| Goniometer Structure | Sample horizontal (θ - θ) | 
| Diffraction Circle Radius | 225mm (or customized as required: 185 - 325mm optional) | 
| Detection Thickness | Metal coating layer analyzable thickness 0.0025μm | 
| Element Content Measurement Range | 1PPM - 99.99% | 
| 2θ Measurement Range | - 110° ~ 168° | 
| Scanning Speed | 0.0012° ~ 50°/min | 
| Angular Positioning Speed | 1500°/min | 
| Scanning Mode | θ/s/θ/d linkage, single action; continuous, stepping, 0mg | 
| Minimum Step Angle | 1/10000° | 
| Angular Repeatability | 1/10000° | 
| 2θ Angular Linearity | The angular deviation of all peaks within the full spectrum range of international standard samples (Si, Al2O3) does not exceed ±0.01° | 
| Detector | Scintillation detector (SC), single - photon detector, high - speed array detector + high - resolution energy detector | 
| Maximum Linear Count Rate | 5×10⁵CPS (SC with spillover count compensation function), 3×10⁵CPS (single photon), 9×10⁵CPS (array), 1.5×10⁵CPS (energy) | 
| Energy Resolution | ≤50% (SC), ≤200eV (single photon), ≤25% (array), ≤140eV (energy) | 
| Counting Mode | Differential or integral mode, automatic PHA, dead time correction | 
| System Measurement Stability | ≤0.01% | 
| Scattered Radiation Dose | ≤1μSv/h (except X - ray protective device) | 
| Instrument Comprehensive Stability | ≤0.1% | 
| Overall Dimensions | 1320×1000×1800mm | 
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