| Sign In | Join Free | My futurenowinc.com |
|
| Sign In | Join Free | My futurenowinc.com |
|
| Categories | Ceramic Substrate |
|---|---|
| Brand Name: | ZMSH |
| Model Number: | SiC Vertical Furnace Tube |
| Certification: | rohs |
| Place of Origin: | CHINA |
| MOQ: | 25 |
| Price: | by case |
| Payment Terms: | T/T |
| Delivery Time: | 2-4 weeks |
| Packaging Details: | package in 100-grade cleaning room |
| Maximum service temperature: | >1700°C |
| Thermal conductivity: | ≥120 W/(m·K) |
| Mohs hardness: | 9.5 |
| Coefficient of thermal expansion: | 4.0~5.0×10⁻⁶/K |
| Elastic modulus: | 410 GPa or higher |
| Applications: | Semiconductor Manufacturing, Industrial Kilns and Energy |
| Company Info. |
| SHANGHAI FAMOUS TRADE CO.,LTD |
| Verified Supplier |
| View Contact Details |
| Product List |
High-Purity SiC Vertical Furnace Tube High-Temperature Resistant
A Silicon Carbide (SiC) Vertical Furnace Tube is a high-performance ceramic structural component manufactured using processes such as reaction sintering or chemical vapor deposition (CVD). It is specifically designed for extreme environments in semiconductor manufacturing, metallurgy, and high-temperature industries. By leveraging the core material properties of silicon carbide—high hardness, high stiffness, low thermal expansion, high thermal conductivity, and excellent chemical stability—it maintains exceptional dimensional stability (with a coefficient of thermal expansion as low as 4.0-5.0×10⁻⁶/K) and structural integrity under conditions exceeding 1700°C, in corrosive atmospheres, and during rapid temperature changes. It provides a reliable material solution for high-temperature processes.
| Feature Category | Core Advantage | Key Parameters/Performance |
| High-Temperature Stability | Extremely low thermal expansion, high temperature resistance | Coefficient of thermal expansion 4.0~5.0×10⁻⁶/K (-196°C to 1600°C), maximum service temperature >1700°C |
| Thermal Management | Excellent thermal conductivity, rapid temperature equalization | Thermal conductivity ≥120 W/(m·K) (room temperature), ~45 W/(m·K) (1200°C) |
| Mechanical Strength | High hardness, high stiffness, resistance to deformation | Mohs hardness 9.5, elastic modulus 410 GPa or higher |
| Chemical Inertness | Resistance to acids, alkalis, and plasma erosion | Corrosion rate in strong acid (70% HNO₃) and strong alkali (45% KOH) <0.2 mg/(cm²·h) |
| Service Life & Reliability | Thermal shock resistance, long life, low maintenance | Withstands thermal shock testing from 1200°C to room temperature (quenching) while maintaining structural integrity, and exhibits dimensional deviation <0.1mm after continuous operation for 2 years in industrial scenarios |
Q1: What is the primary application of a silicon carbide (SiC) vertical furnace tube?
A1: It is primarily used as a high-temperature reactor tube in semiconductor diffusion furnaces, CVD systems, and industrial kilns (e.g., for SiC/GaN epitaxial growth, oxidation, or annealing processes at 1500–1700°C), providing exceptional thermal stability and corrosion resistance in extreme environments.
Q2: Why choose silicon carbide over traditional materials for vertical furnace tubes?
A2: Silicon carbide offers superior high-temperature strength (up to 1700°C), extreme thermal shock resistance (low CTE ~4.5×10⁻⁶/K), and excellent chemical inertness (resisting acids, alkalis, and plasma erosion), ensuring long service life, minimal maintenance, and stable performance in corrosive atmospheres like HCl or metal vapors.
Tags: #SiC Vertical Furnace Tube, #High-Purity, #Customized, #SiC
Ceramics, #High-Temperature Resistant
|
8 Inch Silicon Carbide Ceramic Tray For Epitaxial Growth Processing
Alumina Ceramic Custom Parts Robotic Arm High Hardness Wear Resistant Al2O3 Ceramic Suction Cup Structural Parts
High Precision SIC Silicon Carbide Ceramic Chuck Ceramic Element Vacuum Sucker Customization
SIC Silicon Carbide Ceramic Tube Tube Custom Fire Resistant High Strength Electronic Chemical Industry
Customized Zirconia ZrO2 Ceramic Rod High Wear Resistance
SSIC SiC Mechanical Seal Ring Alumina Ceramic Substrate
Alumina Ceramic Custom Components High Hardness for Semiconductor Manufacturing Equipment
Al2O3 Ceramic Substrate Wafer Excellent Electrical Properties For Mechanical Seals
SiC Square Mirror Mirror-Grade Polishing for Lithography Machine
6 Inch 1.0mm Ceramic Substrate , Alumina Ceramic Plate For Semiconductor Processing
