10.2g/Cm3 Pure Molybdenum Rectangular/Round Plate Sputtering Target For Coating
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10.2g/cm3 Pure Molybdenum Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 Ground Rolling The molybdenum sputtering target has the characteristics of high purity, high density and fine grain, so that the sputtering efficiency, uniform film thickness and smooth etching surface are obtained in sputtering. There are two kinds of molybdenum sputtering...
Zhengzhou Sanhui Refractory Metal Co., Ltd.
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PVD Vacuum Coating Cylindrical Sputtering Targets
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Zirconium Cylindrical Sputtering target for PVD Vacuum Coating Planar Sputtering target for PVD vacuum coating machine is widely used in Multi-arc ion or Magnetron Sputtering PVD vacuum coating industry for decorative PVD coating or functional coating, we......
JINXING MATECH CO LTD
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Molybdenum Planar Sputtering Targets
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... Sputtering Target Molybdenum Sputtering Target 10.2g/Cm3 Molybdenum Plate 10.2g/Cm3 Send Email Inquiry Now Molybdenum Sputtering Target Description In the electronics industry molybdenum sputtering targets are mainly used for flat panel displays,...
Luoyang Hypersolid Metal Tech Co., Ltd
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TZM Molybdenum Disc SGS Molybdenum Sputtering Target For Medical Chemical Industrial
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...Sputtering Target plate sheets Product Description - uniform grain with densified microstructure ensures longer use time. - High special strenghth, high melt point - excellent corrosive resistance, good thermal resistance. - professional after-sales service Commodity Name Pure molybdenum sputtering target Density 10.2g/cm3......
HENAN HUAMAO METAl MATERIALS CO ,LTD
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Photoelectron Semiconductor Molybdenum Sputtering Target
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1. Grade: MO1.MO2 2. Purity :> =99.95% 3. Characteristic: Melting Point: 2610°C Boiling Point:5560°C Density: 10.2g/cm3 High quality, workability 4. Certificate: ISO9001:2008 5. Product Feature: High melting point, High-density, high temperature oxidation ......
Luoyang Forged Tungsten-Molybdenum Material Co., Ltd.
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ODM 10.15g/Cm3 Density Molybdenum Targets For PVD
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...wide application, our targets are widely accepted by customers. 5. we offer the service that if you finished useing the target, send them back to us, and we will pay. Molybdenum targets are our best advantaged products. We can make as big dimension as T...
Fonlink Photoelectric (Luoyang) Co., ltd
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Metal Nickel target,Nickel Oxide Target
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...) Nickel Oxide (NiO) Evaporation Material Purity--- 99.5%, 99.9% Refractive Index---2-2.1 Transparence Wave Band----0.52um Shape---Ø10 Density---7.45g/cm3 Melting Point --...
Hebei Niuke Technology Co., Ltd
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Law Enforcement Bulletproof Plates , Ceramic Armor Plates 3.15g / Cm3 Density
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...Cm3 Density law enforcement bulletproof ceramic plates Protect level: NIJ IIA, NIJ II, NIJIIIA, NIJIII, NIJ IV NIJ IV is the most safe level Size: 250 x 300mm (10 x 12 inch) 200 x 250mm (8 x 10 inch) 200x 200mm (8 x 8 inch) 150 x 200mm (6 x 8 inch) We have other sizes available. Boron Carbide Tile Uses: Systems, semiconductor components, sputtering targets......
China Hunan High Broad New Material Co.Ltd
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RO5200 Ta1 Tantalum Rotating Target Tantalum Tube Target 100mm For CVD PVD
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...target is a tubular tantalum target, also known as tantalum rotating target. Name Tantalum Rotating Target Tantalum Tube Target Purity ≥99.95% Grade RO5200,RO5400,RO5252,RO5255,Ta1,Ta2 Density 16.68g/cm3 Atomic weight 180.94788 Sputtering method DC Thermal conductivity 57 W/m.K Thermal expansion coefficient 6.3 x 10-6 /K Size OD: 20~300mm Wall thickness: ≥ 0.5mm Application of Ta Rotating Target......
Shaanxi Peakrise Metal Co.,Ltd
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5mm Sand Blasting Molybdenum Round Bar For Machinery Parts
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... luster Standard ASTM B387 Application Electric light source parts, heat shield, heat bodies in high temperature furnaces, sputtering target, and medical facilities, etc. Type and Size Type Swaged Rods Straightened Rods after Drawn Ground or...
JIANGSU MITTEL STEEL INDUSTRIAL LIMITED
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