Metal Sputtering Target Titanium Aluminum Chrome Zirconium Nickel Niobium Tantalum Molybdenum PVD Coating Evaporation
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Metal Sputtering Target Titanium Aluminum Chrome Zirconium Nickel Niobium Tantalum Molybdenum PVD Coating evaporation Metal sputtering targets are used in physical vapor deposition (PVD) processes to coat materials with a thin layer of metal. Common metals used for sputtering targets......
Baoji City Changsheng Titanium Co.,Ltd
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99.95% / 99.99% Nickel Sputtering Target High Density Customized Size 3N5~4N
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Nickel Plate Sputtering Target high purity 99.95%, 99.99%, High purity material, ultra-high purity material, semiconductor high purity material Materials world provides high-......
JINXING MATECH CO LTD
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Metal Sputtering Targets Gr1 Gr2 Gr5 Titanium Sputtering Silver Sputtering Target For PVD Vacuum Coating Machine
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Metal Sputtering Targets Gr1 Gr2 Gr5 Titanium Sputtering Silver Sputtering Target For PVD Vacuum Coating Machine Product Details: Grade: Gr1 Gr2 Gr5 Titanium ,TiAl, TiCr, TiCu,TiSi,Mo,Cr etc. As customers' requests Size: 60/65/70/80/85/90/95/100(D)/200/300/400×20/30/32/35/40/42/45/50(T) Or as customers' requests Surface: bright surface Application: Coating industry, sputtering......
Baoji Lihua Nonferrous Metals Co., Ltd.
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99.99% Pure Titanium Disc 4n High Purity Ti Metal Sputtering Target Low Density
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Pure Titanium 99.99% 4n Disc High Purity Ti Metal Sputtering Target Titanium is metallic and ductile. Sound travels at a rate of 5,090 m/s. The main characteristics of titanium are low density, high mechanical strength and easy processing. The ......
Gnee Steel (tianjin) Co., Ltd.
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W-Ti Metal Sputtering Targets Planar Billet For Semiconductor Physical Vapor Depot
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Ultra high purity tungsten alloy W-Ti sputtering target Plate Planar Billet for Semiconductor Physical Vapor Deposition Tungsten-titanium (WTi) films are known to act as the effective diffusion barrier between Al and Si in semiconductor and photovoltaic ......
Luoyang Forged Tungsten-Molybdenum Material Co., Ltd.
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99.99% SiO2 Silicon Dioxide Sputtering Target Frosting Surface High Chemical Purity
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99.99% SiO2 Sputtering Target Natural quartz glass has excellent transmission in the UV range. Synthetic quartz glass (fused silica) is of the highest purity due to the special ......
Yantai ZK Optics Co., Ltd.
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3N5 99.95% Molybdenum Sputtering Target For Vacuum Coating
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... There are two kinds of molybdenum sputtering targets:molybdenum planar target and molybdenum rotary target. Molybdenum sputtering target is one kind of industrial material, which is widely used in conductive glass, STN / TN / TFT-LCD, optical glass,...
Zhengzhou Sanhui Refractory Metal Co., Ltd.
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High Purity 99.97% Tungsten Target Ground Surface Condition For Sputtering Coating
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... spectrometry (GDMS), and inductively coupled plasma (ICP); 2. Tungsten target from Achemetal is provided with high purity up to 99.97%, density 18.8-19g/cm3, homogeneous organization structure, and fine grain; 3. Our tungsten sputtering target has been...
Luoyang Hypersolid Metal Tech Co., Ltd
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Aerospace Industry 99% Density Tungsten Targets High Purity
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... industry, rare earth industry, chemical equipment area, medical equipment area, melting equipment, oil industry etc. Tungsten targets are our advantaged products. They are covering the target to protect the surface of the target. We can...
Fonlink Photoelectric (Luoyang) Co., ltd
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Metal Nickel target,Nickel Oxide Target
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...) Rectangle, Sheet, Step (Length ≤300mm, Width ≤200mm, Thickness ≥1mm) Nickel Oxide (NiO) Evaporation Material Purity--- 99.5%, 99.9% Refractive Index---2-2.1 Transparence Wave Band----0.52um Shape---Ø10 Density---7.45g/cm3 Melting Point --...
Hebei Niuke Technology Co., Ltd
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