Titanium Silicon Alloy Metal Sputtering Targets With Excellent Oxidation Resistance
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...Sputtering Target (TiSi) alloy 85:15/ 80:20 / 75:25 at% TiSi sputtering target has a wide range of application prospects in machining, electronics, optics and other fields. TiSi target is produced by hot isostatic pressing, smelting and other technologies Silicon alloy......
JINXING MATECH CO LTD
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98 X 12mm Dental Implants Titanium Discs Metal Sputtering Target Teeth Crown / Bridge
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... Dental pure titanium disc, due to high purity, low hardness, good toughness, so suitable for movable brackets and fully displaned metal crowns. Gr5 Dental titanium alloy disc,due to the addition of aluminum, vanadium and other elements, improve the...
Baoji City Changsheng Titanium Co.,Ltd
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Gr1 Gr2 Gr5 TiAl titanium alloy Titanium Sputtering Target
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...Alloy Titanium Sputtering Target For PVD Coating Gr1 Gr2 Gr5 TiAl titanium alloy Titanium Sputtering Target For PVD coating 1.The target material The target material is the target material bombarded by high-speed charged particles. There are metals, alloys, oxides, etc. Replace different target materials (such as aluminum, copper, stainless steel, titanium, nickel targets......
Baoji Lihua Nonferrous Metals Co., Ltd.
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Non Magnetic Molybdenum Copper Alloy Magnetron Sputtering Target Molybdenum Alloy Target
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...Alloy Magnetron Sputtering Target 1. Description of Molybdenum Copper Alloy Magnetron Sputtering Target: The preparation of molybdenum-copper alloy magnetron sputtering targets is mainly by infiltration method. First, molybdenum powder with coarse particle size is used to sinter into a molybdenum billet skeleton, and then infiltrated in copper liquid to obtain molybdenum-copper alloys......
Shaanxi Peakrise Metal Co.,Ltd
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Non Magnetic Molybdenum Copper Alloy Magnetron Sputtering Target Molybdenum Alloy Target
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...Alloy Magnetron Sputtering Target 1. Description of Molybdenum Copper Alloy Magnetron Sputtering Target: The preparation of molybdenum-copper alloy magnetron sputtering targets is mainly by infiltration method. First, molybdenum powder with coarse particle size is used to sinter into a molybdenum billet skeleton, and then infiltrated in copper liquid to obtain molybdenum-copper alloys......
Shaanxi Peakrise Metal Co.,Ltd
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W-Ti Metal Sputtering Targets Planar Billet For Semiconductor Physical Vapor Depot
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...alloy W-Ti sputtering target Plate Planar Billet for Semiconductor Physical Vapor Deposition Tungsten-titanium (WTi) films are known to act as the effective diffusion barrier between Al and Si in semiconductor and photovoltaic cells industry. WTifilms are typically deposited as thin films by physical vapor deposition (PVD) through sputtering of a WTialloy target. It is desirable to produce a target......
Luoyang Forged Tungsten-Molybdenum Material Co., Ltd.
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99.99% Pure Titanium Disc 4n High Purity Ti Metal Sputtering Target Low Density
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...High Purity Ti Metal Sputtering Target Titanium is metallic and ductile. Sound travels at a rate of 5,090 m/s. The main characteristics of titanium are low density, high mechanical strength and easy processing. The new titanium alloy has good heat ......
Gnee Steel (tianjin) Co., Ltd.
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Pulsed Laser Deposition PLD Systems Sputter Target for DC RF Magnetron Sputtering Systems
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... , Compound , and various ceramic target , such as Oxide , Nitride , Carbide , Boride , Sulfide , Selenide and Telluride sputter target .We provide a complete line of sputtering target materials suitable for Pulsed Laser Deposition ( PLD ) systems and...
HENAN ZG INDUSTRIAL PRODUCTS CO.,LTD
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Customized Aluminum Sheets Metal Al Sputtering Target 0.2mm 7075
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...strength (>500 MPa) and its low density make the material a fit for applications such as aircraft parts or parts subject to heavy wear. While it is less corrosion resistant than other alloys (such as 5052 aluminum alloy, which is exceptionally resistant to...
Wuxi Cheng Yue Metal Materials Co., Ltd.
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3N5 99.95% Molybdenum Sputtering Target For Vacuum Coating
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... There are two kinds of molybdenum sputtering targets:molybdenum planar target and molybdenum rotary target. Molybdenum sputtering target is one kind of industrial material, which is widely used in conductive glass, STN / TN / TFT-LCD, optical glass,...
Zhengzhou Sanhui Refractory Metal Co., Ltd.
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