Zirconium Sputtering Target For PVD Coating Systerm Decorative Coating
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Zirconium Sputtering Target Zirconium sputtering target for PVD coating systerm, coating target, multi-arc target, sputtering target, vacuum coating target. Description Zirconium Sputtering Target, Zirconium Target are available in varying sizes Grades: R60702, 99.2%min Purity: 99.5% Purity: 99.95% Hf<300ppm or Hf<4.5%) Shape: Round Shape , Tube Shape and Plate Shape. Sizes: Plate sputtering targets......
JINXING MATECH CO LTD
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Pure Zirconium Sputtering Target Low Density Good Thermal Properties
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...zirconium sputtering target coating materials customization Zirconium Description Zirconium and zirconium alloys have low density, high specific strength, corrosion resistance, radiation resistance, excellent wear resistance, excellent processing performance, non-toxic,non-magnetic, compared with traditional stainless steel, copper, nickel, titanium and other metal alloys, zirconium and zirconium......
Luoyang Forged Tungsten-Molybdenum Material Co., Ltd.
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Metal Sputtering Target Titanium Aluminum Chrome Zirconium Nickel Niobium Tantalum Molybdenum PVD Coating Evaporation
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...Sputtering Target Titanium Aluminum Chrome Zirconium Nickel Niobium Tantalum Molybdenum PVD Coating evaporation Metal sputtering targets are used in physical vapor deposition (PVD) processes to coat materials with a thin layer of metal. Common metals used for sputtering targets include titanium, aluminum, chrome, zirconium......
Baoji City Changsheng Titanium Co.,Ltd
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High Purity Titanium Sputtering Targets For PVD Vacuum Coating Machine
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...Sputtering Targets for PVD Vacuum Coating Machine High purity titanium sputtering targets Product name Titanium Sputtering Targets for pvd coating machine Grade Titanium (Gr1, Gr2, Gr5, Gr7,GR12) Alloy target: Ti-Al, Ti-Cr, Ti-Zr etc Other materials:chrome,zirconium,copper ,tungsten etc. Origin Baoji city, Shaanxi Province,hina Titanium content ≥99.5 (%) Impurity content <0.04(%) Density 4.51 or 4.50 g/cm3 Standard ASTM...
Baoji Lihua Nonferrous Metals Co., Ltd.
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Molybdenum Planar Sputtering Targets
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... Sputtering Target Molybdenum Sputtering Target 10.2g/Cm3 Molybdenum Plate 10.2g/Cm3 Send Email Inquiry Now Molybdenum Sputtering Target Description In the electronics industry molybdenum sputtering targets are mainly used for flat panel displays,...
Luoyang Hypersolid Metal Tech Co., Ltd
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ASTM B861 Titanium Gr2 Tube Sputtering Target 2940mm Length
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...Target ASTM B861-06 a 133OD*125ID*2940L Include Flange Titanium Gr2 Name Titanium tube target Standard ASTM B861 Transport Package Vacuum package in wooden case Origin Baoji, Shaanxi, China Port of deliver Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port Size φ133*φ125*2940(include flange ) Tube target is a sputtering source which can form various functional films on the substrate by magnetron sputtering......
Baoji Feiteng Metal Materials Co., Ltd.
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3N5 99.95% Molybdenum Sputtering Target For Vacuum Coating
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... There are two kinds of molybdenum sputtering targets:molybdenum planar target and molybdenum rotary target. Molybdenum sputtering target is one kind of industrial material, which is widely used in conductive glass, STN / TN / TFT-LCD, optical glass,...
Zhengzhou Sanhui Refractory Metal Co., Ltd.
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Natural Compound Fused Silica Sputtering Target High Temperature Resistant
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High temperature resistant high quality fused silica sputtering target Silicon dioxide sputtering target contains Si and O. Silicon dioxide (SiO2), also known as Silica, is a natural compound made from two of the most abundant materials on the planet: ......
Yantai ZK Optics Co., Ltd.
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Gr2 Gr1 DIA 100*40MM Round Titanium Sputtering Target For Vacuum Coating
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...Gr2 Gr1 DIA 100*40MM Round Titanium Sputtering Target For Vacuum Coating Shape round/Square according to your request Density ≥4.51g/cm³ Type As per customers' requirement Standard ASTM F67,ASTM F136 ASTM B381 Size Diameter 100mm ,thickness 40mm Surface......
Shaanxi Peakrise Metal Co.,Ltd
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Pulsed Laser Deposition PLD Systems Sputter Target for DC RF Magnetron Sputtering Systems
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... , Compound , and various ceramic target , such as Oxide , Nitride , Carbide , Boride , Sulfide , Selenide and Telluride sputter target .We provide a complete line of sputtering target materials suitable for Pulsed Laser Deposition ( PLD ) systems and...
HENAN ZG INDUSTRIAL PRODUCTS CO.,LTD
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