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chromium carbide sputtering target

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Chromium Carbide Sputtering Target(CrC Sputtering Target)

China Chromium Carbide Sputtering Target(CrC Sputtering Target) on sale
Chromium Carbide Sputtering Target is a compound formed by chromium (Cr) and carbon (C), combining the electrical conductivity of metals with the high hardness of ceramics. Made from high-purity chromium carbide powder via processes such as hot-pressing sintering or spraying, chromium carbide targets exhibit high melting point, high strength, and excellent thermal stability. In coating processes such as magnetron sputtering......
Shenzhen APG Material Company Limited

Address: HQ Add:Rooms 1401,Bldg.2,Runzhi R&D Center,CRB Tech-Innovative City, Xinan Street,Bao'an District,Shenzhen,China

Chromium Sputter Coater Targets,Chromium Cr Sputtering Targets,Disc or Annular Sputter Targets for Sputter Coaters

China Chromium Sputter Coater Targets,Chromium Cr Sputtering Targets,Disc or Annular Sputter Targets for Sputter Coaters on sale
Chromium Sputter Coater Targets,Chromium Cr Sputtering Targets,Disc or Annular Sputter Targets for Sputter Coaters Information Chromium is one of the most popular metals in the world. Chromium is a silvery, lustrous, hard, and brittle metal known for its ......
JINXING MATECH CO LTD

Address: NO.57 KEXUEDADAO ROAD

Sputtering Target Chromium Cr 100x40mm Hot Isostatic Pressing

China Sputtering Target Chromium Cr 100x40mm Hot Isostatic Pressing on sale
The chromium sputtering target material is produced by the advanced hot isostatic pressing (HIP) process. sputtering target include rectangular target, arc target, ring target and large aspect ratio integrally formed tube target, etc., with controllable ......
Baoji City Changsheng Titanium Co.,Ltd

Address: No.26 Baotai Road, Weibin District, Baoji City

Feiteng Magnetron Cr Sputtering Target OD127*ID458*10

China Feiteng Magnetron Cr Sputtering Target OD127*ID458*10 on sale
Chromium Plate Target Pure>3N5 127*458*10 Chromium Sputtering Target Item name Chromium Plate target Size OD127*ID458*10 Pure Pure>3N5 Packaging Vacuum package in wooden case Port of place Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port Related product magnetron sputtering target Rotary Target ito rotary target Titanium Rotary Target Vacuum Package Rotary Target titanium sputtering target Vacuum Coating Target......
Baoji Feiteng Metal Materials Co., Ltd.

Address: Gaoya Village Industrial Park, Bayu Town, high tech Development Zone, Baoji City, Shaanxi Province, China

High Purity Pvd Titanium Sputtering Target Metal Target Customized

China High Purity Pvd Titanium Sputtering Target Metal Target Customized on sale
.... It can be devided into pure non-ferrous metal target, pure titanium Ti, pure nickel Ni, chromium Cr, niobium Nb, aluminum Al, molybdenum Mo according to the material. In principle, all kinds of metals can be used as targets.The sputtering targets we can...
Baoji Lihua Nonferrous Metals Co., Ltd.

Address: No. 3, Gaoya Industrial Park, Baotai Road, Gaoxin Development Zone, Baoji City, Shaanxi Province,China

Pulsed Laser Deposition PLD Systems Sputter Target for DC RF Magnetron Sputtering Systems

China Pulsed Laser Deposition PLD Systems Sputter Target for DC RF Magnetron Sputtering Systems on sale
... , Compound , and various ceramic target , such as Oxide , Nitride , Carbide , Boride , Sulfide , Selenide and Telluride sputter target .We provide a complete line of sputtering target materials suitable for Pulsed Laser Deposition ( PLD ) systems and...
HENAN ZG INDUSTRIAL PRODUCTS CO.,LTD

Address: No. 26, Dongqing Street, High-tech Zone, Zhengzhou ,Henan, China

10.2g/Cm3 Pure Molybdenum Rectangular/Round Plate Sputtering Target For Coating

China 10.2g/Cm3 Pure Molybdenum Rectangular/Round Plate Sputtering Target For Coating on sale
...Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 Ground Rolling The molybdenum sputtering target has the characteristics of high purity, high density and fine grain, so that the sputtering efficiency, uniform film thickness and smooth etching surface are obtained in sputtering. There are two kinds of molybdenum sputtering...
Zhengzhou Sanhui Refractory Metal Co., Ltd.

Address: Rm.2009,20th Floor,Unit C,Yuhong Plaza,No. 61 Zijingshan Road,Zhengzhou,China

Natural Compound Fused Silica Sputtering Target High Temperature Resistant

China Natural Compound Fused Silica Sputtering Target High Temperature Resistant on sale
High temperature resistant high quality fused silica sputtering target Silicon dioxide sputtering target contains Si and O. Silicon dioxide (SiO2), also known as Silica, is a natural compound made from two of the most abundant materials on the planet: ......
Yantai ZK Optics Co., Ltd.

Address: Jidong Industraial Park, Qianbaihujian, Yangfang Town, Changping District, Beijing, China

High-Dielectric Lanthanum Sputtering Target for Leakage-Free Semiconductor Memory Chip Fabrication

China High-Dielectric Lanthanum Sputtering Target for Leakage-Free Semiconductor Memory Chip Fabrication on sale
...ough precision processing, featuring excellent film uniformity, density, and sputtering stability. It is suitable for various coating processes, such as magnetron sputtering and ion beam sputtering. Application Areas 1.Semiconductor Memory Chips: Used for...
Shanghai Sheeny Metal Mateirals Co.,Ltd.

Address: Room 210, Kaidi Building, No. 688, Huajiang Road, Jiading District, Shanghai

Molybdenum Planar Sputtering Targets

China Molybdenum Planar Sputtering Targets on sale
... Sputtering Target Molybdenum Sputtering Target 10.2g/Cm3 Molybdenum Plate 10.2g/Cm3 Send Email Inquiry Now Molybdenum Sputtering Target Description In the electronics industry molybdenum sputtering targets are mainly used for flat panel displays,...
Luoyang Hypersolid Metal Tech Co., Ltd

Address: Luoyang National University Science and Technology Park

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