Hafnium sputtering target(Ha sputtering target)
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Hafnium sputtering targets are sputtering targets made from high-purity hafnium metal (Hf), featuring a high melting point (~2227℃), excellent corrosion resistance, good ductility, and outstanding thermal neutron absorption. They are widely used in semiconductor manufacturing, optical coatings, nuclear industry, and high-temperature alloys. Hafnium......
Shenzhen APG Material Company Limited
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Cobalt Chromium Alloy Sputtering Targets, Cobalt Chromium Sputtering Target Highly Pure
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...Sputtering Targets Product Description XINXIANG FANMETAL in produce high quality sputtering target, ceramic target, metal target. The products are applied to various fields of vacuum coating by various methods (magnetron sputtering, vacuum plating, etc.) : Scientific research, aerospace, automotive, microelectronics, integrated circuit industry, light source, optics, decoration, flat......
JINXING MATECH CO LTD
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99.995% Purity Titanium Sputtering Target PVD Coating Rotary Tube Targets
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...Sputtering Target PVD Coating Rotary Tube Targets Titanium target is one of the commonly used targets for preparing thin film materials, and has been widely used in magnetron sputtering technology. Such as integrated circuits, decorative coating industry, flat display and so on are needed. Therefore, the quality of titanium target is very important, and good titanium target......
Baoji City Changsheng Titanium Co.,Ltd
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Aluminum Neodymium Alloy Sputtering Target for High-Quality Display & Touch Screen Electrode Coating
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...high-purity aluminum and neodymium through precision alloying processes, featuring uniform alloy composition and stable sputtering performance. The formed film effectively suppresses "hillock" growth in the electrode layer, improving electrode flatness and...
Shanghai Sheeny Metal Mateirals Co.,Ltd.
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10.2g/Cm3 Pure Molybdenum Rectangular/Round Plate Sputtering Target For Coating
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...Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 Ground Rolling The molybdenum sputtering target has the characteristics of high purity, high density and fine grain, so that the sputtering efficiency, uniform film thickness and smooth etching surface are obtained in sputtering. There are two kinds of molybdenum sputtering...
Zhengzhou Sanhui Refractory Metal Co., Ltd.
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Molybdenum Planar Sputtering Targets
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... Sputtering Target Molybdenum Sputtering Target 10.2g/Cm3 Molybdenum Plate 10.2g/Cm3 Send Email Inquiry Now Molybdenum Sputtering Target Description In the electronics industry molybdenum sputtering targets are mainly used for flat panel displays,...
Luoyang Hypersolid Metal Tech Co., Ltd
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Natural Compound Fused Silica Sputtering Target High Temperature Resistant
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High temperature resistant high quality fused silica sputtering target Silicon dioxide sputtering target contains Si and O. Silicon dioxide (SiO2), also known as Silica, is a natural compound made from two of the most abundant materials on the planet: ......
Yantai ZK Optics Co., Ltd.
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99.6% Purity GR1 GR2 Round Titanium Sputtering Target Hardware
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...target" in "titanium sputtering target" comes from the common target materials in our daily life. In the sputtering deposition process, the coating material is bombarded by the electron beam or ion beam, just like the target is hit, so the material used in the sputtering process is called the "sputtering target". From metal titanium to titanium sputtering target Titanium sputtering target......
Baoji Lihua Nonferrous Metals Co., Ltd.
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Pure Rare Earth Oxides Hafnium Cylinder Pellet Hf Sputtering Targets Material
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Hafnium Pellet 99.9% Pure Hf pellet 3N for sale Products attributes of Hf pellets Item Name PVD Coating materials Hf pellet Purity 99.99% Shape Square/Round, According to your request according to your request Available size Normal size:2*5mm,3*3mm,6*6mm ......
China Hunan High Broad New Material Co.Ltd
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Feiteng Magnetron Cr Sputtering Target OD127*ID458*10
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...Target Pure>3N5 127*458*10 Chromium Sputtering Target Item name Chromium Plate target Size OD127*ID458*10 Pure Pure>3N5 Packaging Vacuum package in wooden case Port of place Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port Related product magnetron sputtering target Rotary Target ito rotary target Titanium Rotary Target Vacuum Package Rotary Target titanium sputtering target Vacuum Coating Target......
Baoji Feiteng Metal Materials Co., Ltd.
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