Metallic Pure Polished Molybdenum Sputtering Targets
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...Pure Polished Molybdenum Round Target Description Pure Molybdenum Round Target, also known as molybdenum sputtering target, can be divided into two types, that is, molybdenum planar target and molybdenum rotary target. Features of Molybdenum Round Target 1. Thin-film deposited from molybdenum sputtering target is high in density and adhesion; 2. Molybdenum......
JINXING MATECH CO LTD
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3N5 99.95% Molybdenum Sputtering Target For Vacuum Coating
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... There are two kinds of molybdenum sputtering targets:molybdenum planar target and molybdenum rotary target. Molybdenum sputtering target is one kind of industrial material, which is widely used in conductive glass, STN / TN / TFT-LCD, optical glass,...
Zhengzhou Sanhui Refractory Metal Co., Ltd.
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20mm Molybdenum Sputtering Targets For The Semiconductor Industry Molybdenum Target Molybdenum Disc molybdenum products
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Molybdenum Sputtering Targets For The Semiconductor Industry 1. Description Of Molybdenum Sputtering Targets For The Semiconductor Industry: Molybdenum is a versatile refractory metal with outstanding mechanical qualities, a low coefficient of expansion, strong thermal conductivity, and exceptionally high electrical conductivity at high temperatures. There are numerous combinations that can be used as sputtering targets, including pure molybdenum...
Shaanxi Peakrise Metal Co.,Ltd
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TZM Molybdenum Disc SGS Molybdenum Sputtering Target For Medical Chemical Industrial
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...Molybdenum and the alloys Disc sheet plate, Sputtering Target plate sheets Product Description - uniform grain with densified microstructure ensures longer use time. - High special strenghth, high melt point - excellent corrosive resistance, good thermal resistance. - professional after-sales service Commodity Name Pure molybdenum sputtering target......
HENAN HUAMAO METAl MATERIALS CO ,LTD
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Molybdenum Sputter Targets Sheet Round Square Triangular Sheet Pure Molybdenum Tube
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...Molybdenum sputter targets are made from pure molybdenum (Mo) metal. Density: Molybdenum has a high density, typically ranging from 10.2 to 10.3 grams per cubic centimeter (g/cm³). Melting Point: Molybdenum has a very high melting point of approximately 2,623 degrees Celsius (4,753 degrees Fahrenheit), which allows it to withstand high-temperature sputtering processes. Thermal Conductivity: Molybdenum......
Luoyang Hypersolid Metal Tech Co., Ltd
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Pure Zirconium Sputtering Target Low Density Good Thermal Properties
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high purity 99.95% zirconium sputtering target coating materials customization Zirconium Description Zirconium and zirconium alloys have low density, high specific strength, corrosion resistance, ......
Luoyang Forged Tungsten-Molybdenum Material Co., Ltd.
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High Purity Pvd Titanium Sputtering Target Metal Target Customized
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.... It can be devided into pure non-ferrous metal target, pure titanium Ti, pure nickel Ni, chromium Cr, niobium Nb, aluminum Al, molybdenum Mo according to the material. In principle, all kinds of metals can be used as targets.The sputtering targets we can...
Baoji Lihua Nonferrous Metals Co., Ltd.
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Metal Sputtering Target Titanium Aluminum Chrome Zirconium Nickel Niobium Tantalum Molybdenum PVD Coating Evaporation
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...Sputtering Target Titanium Aluminum Chrome Zirconium Nickel Niobium Tantalum Molybdenum PVD Coating evaporation Metal sputtering targets are used in physical vapor deposition (PVD) processes to coat materials with a thin layer of metal. Common metals used for sputtering targets include titanium, aluminum, chrome, zirconium, nickel, niobium, tantalum, and molybdenum......
Baoji City Changsheng Titanium Co.,Ltd
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Non Magnetic Molybdenum Copper Alloy Magnetron Sputtering Target Molybdenum Alloy Target
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Molybdenum Copper Alloy Magnetron Sputtering Target 1. Description of Molybdenum Copper Alloy Magnetron Sputtering Target: The preparation of molybdenum-copper alloy magnetron sputtering targets is mainly by infiltration method. First, molybdenum powder with coarse particle size is used to sinter into a molybdenum billet skeleton, and then infiltrated in copper liquid to obtain molybdenum......
Shaanxi Peakrise Metal Co.,Ltd
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Feiteng Magnetron Cr Sputtering Target OD127*ID458*10
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...Target Pure>3N5 127*458*10 Chromium Sputtering Target Item name Chromium Plate target Size OD127*ID458*10 Pure Pure>3N5 Packaging Vacuum package in wooden case Port of place Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port Related product magnetron sputtering target Rotary Target ito rotary target Titanium Rotary Target Vacuum Package Rotary Target titanium sputtering target Vacuum Coating Target......
Baoji Feiteng Metal Materials Co., Ltd.
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