Titanium Plate Sputtering Targets High Purity For Semiconductor Chips
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Titanium Plate Sputtering Target high purity 99.99%, 99.999% High purity material, ultra-high purity material, semiconductor high purity material Products include low oxygen ultra-high purity titanium material, high-end titanium alloy material, production ......
JINXING MATECH CO LTD
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99.9% Titanium Tantalum Sputtering Target Rhodium Material Round Shape
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...Titanium Metal Sputtering Target For Thin Film Coating, Tantalum / Rhodium /Ruthenium Sputtering Target Square Pure Titanium Sputtering Target High Purity 99.995% Circular Ti Titanium Sputtering Target Titanium sputtering target PVD coating Grade 1 Titanium Arc Target Ti Target titanium sputtering target 99.9% Tiox Titanium Oxide Rotary Target sputtering target Pvd vacuum coating Titanium Oxide TIOX Sputtering......
Baoji Quality Metals Co., Ltd.
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Gr5 Gr7 Titanium Silver Sputtering Target for High Purity Sputtering in Medical Applications Density 4.5 g/cm3
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...Sputtering Target Titanium Sputtering Titanium Sputtering Target to High Purity Sputtering in Medical Applications In the rapidly advancing field of medical technology, the demand for high-quality materials is paramount. Among these materials, Grade 5 and Grade 7 titanium sputtering targets stand out for their exceptional properties and versatility. These high purity PVD (Physical Vapor Deposition) titanium sputtering targets...
Baoji Lihua Nonferrous Metals Co., Ltd.
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10.2g/Cm3 Pure Molybdenum Rectangular/Round Plate Sputtering Target For Coating
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...Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 Ground Rolling The molybdenum sputtering target has the characteristics of high purity, high density and fine grain, so that the sputtering efficiency, uniform film thickness and smooth etching surface are obtained in sputtering. There are two kinds of molybdenum sputtering...
Zhengzhou Sanhui Refractory Metal Co., Ltd.
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W Tungsten Target Rare Earth Smelting Titanium Tungsten Sputtering Target
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W Tungsten Sputtering Targets Aerospace, Rare Earth Smelting Tungsten Sputtering Targets widely used in Aerospace, rare earth smelting, electric light source, chemical equipment, medical equipment, metallurgical machinery, smelting equipment, petroleum......
Luoyang Hypersolid Metal Tech Co., Ltd
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Feiteng Magnetron Cr Sputtering Target OD127*ID458*10
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...Plate Target Pure>3N5 127*458*10 Chromium Sputtering Target Item name Chromium Plate target Size OD127*ID458*10 Pure Pure>3N5 Packaging Vacuum package in wooden case Port of place Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port Related product magnetron sputtering target Rotary Target ito rotary target Titanium Rotary Target Vacuum Package Rotary Target titanium sputtering target Vacuum Coating Target......
Baoji Feiteng Metal Materials Co., Ltd.
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99.995% Purity Titanium Sputtering Target PVD Coating Rotary Tube Targets
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...Titanium Sputtering Target PVD Coating Rotary Tube Targets Titanium target is one of the commonly used targets for preparing thin film materials, and has been widely used in magnetron sputtering technology. Such as integrated circuits, decorative coating industry, flat display and so on are needed. Therefore, the quality of titanium target is very important, and good titanium target can prepare qualified PVD coating. Titanium......
Baoji City Changsheng Titanium Co.,Ltd
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Corrosion Resistance Titanium Alloy Pvd Target For Medical / Industrial Coating
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...Titanium Alloy Pvd Target For Medical / Industrial Coating Specification: Item Name GR1 GR2 GR5 Titanium Alloy pvd Targets/Titanium Sputtering Targets for coating Material Titanium (Gr1, Gr2, Gr5, Gr7,GR12) Alloy target: Ti-Al, Ti-Cr, Ti-Zr etc Standard ASTM B381; ASTM F67, ASTM F136 size 1. Ø30--2000mm, thickness 3.0mm--300mm; 2. Plate......
Baoji Minghai Titanium Industry Co.,ltd.
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99.99% Pure Titanium Disc 4n High Purity Ti Metal Sputtering Target Low Density
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... Titanium 99.99% 4n Disc High Purity Ti Metal Sputtering Target Titanium is metallic and ductile. Sound travels at a rate of 5,090 m/s. The main characteristics of titanium are low density, high mechanical strength and easy processing. The new titanium ......
Gnee Steel (tianjin) Co., Ltd.
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W-Ti Metal Sputtering Targets Planar Billet For Semiconductor Physical Vapor Depot
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...sputtering target Plate Planar Billet for Semiconductor Physical Vapor Deposition Tungsten-titanium (WTi) films are known to act as the effective diffusion barrier between Al and Si in semiconductor and photovoltaic cells industry. WTifilms are typically deposited as thin films by physical vapor deposition (PVD) through sputtering of a WTialloy target. It is desirable to produce a target......
Luoyang Forged Tungsten-Molybdenum Material Co., Ltd.
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