10 49 g cm3 sputtering targets

Brand Name:Sanhui

Model Number:Mo1

Place of Origin:Henan, China

10.2g/cm3 Pure Molybdenum Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 Ground Rolling The molybdenum sputtering target has the characteristics of high purity, high density and fine grain, so that the sputtering efficiency, uniform film thickness and smooth etching surface are obtained in sputtering. There are two kinds of molybdenum sputtering

Brand Name:JINXING

Model Number:Zirconium Sputtering Target

Place of Origin:China

Zirconium Cylindrical Sputtering target for PVD Vacuum Coating Planar Sputtering target for PVD vacuum coating machine is widely used in Multi-arc ion or Magnetron Sputtering PVD vacuum coating industry for decorative PVD coating or functional coating, we...

Categories:Molybdenum Products

Country/Region:china

... Sputtering Target Molybdenum Sputtering Target 10.2g/Cm3 Molybdenum Plate 10.2g/Cm3 Send Email Inquiry Now Molybdenum Sputtering Target Description In the electronics industry molybdenum sputtering targets are mainly used for flat panel displays,

Brand Name:HMD

Model Number:NONE

Place of Origin:CHN

...Sputtering Target plate sheets Product Description - uniform grain with densified microstructure ensures longer use time. - High special strenghth, high melt point - excellent corrosive resistance, good thermal resistance. - professional after-sales service Commodity Name Pure molybdenum sputtering target Density 10.2g/cm3...

Brand Name:FGD

Model Number:fgd t-001

Place of Origin:China

1. Grade: MO1.MO2 2. Purity :> =99.95% 3. Characteristic: Melting Point: 2610°C Boiling Point:5560°C Density: 10.2g/cm3 High quality, workability 4. Certificate: ISO9001:2008 5. Product Feature: High melting point, High-density, high temperature oxidation ...

Brand Name:Sifon

Model Number:5mm*W*L

Place of Origin:China

...wide application, our targets are widely accepted by customers. 5. we offer the service that if you finished useing the target, send them back to us, and we will pay. Molybdenum targets are our best advantaged products. We can make as big dimension as T

Categories:oxide metal and others targets

Country/Region:china

...) Nickel Oxide (NiO) Evaporation Material Purity--- 99.5%, 99.9% Refractive Index---2-2.1 Transparence Wave Band----0.52um Shape---Ø10 Density---7.45g/cm3 Melting Point --

Brand Name:OEM/High Broad

Model Number:SIC bullet proof vest / SIC bullet wear resistant plates / anti bullet vest

Place of Origin:China

...Cm3 Density law enforcement bulletproof ceramic plates Protect level: NIJ IIA, NIJ II, NIJIIIA, NIJIII, NIJ IV NIJ IV is the most safe level Size: 250 x 300mm (10 x 12 inch) 200 x 250mm (8 x 10 inch) 200x 200mm (8 x 8 inch) 150 x 200mm (6 x 8 inch) We have other sizes available. Boron Carbide Tile Uses: Systems, semiconductor components, sputtering targets...

Brand Name:PRM

Model Number:Custom

Place of Origin:China

...target is a tubular tantalum target, also known as tantalum rotating target. Name Tantalum Rotating Target Tantalum Tube Target Purity ≥99.95% Grade RO5200,RO5400,RO5252,RO5255,Ta1,Ta2 Density 16.68g/cm3 Atomic weight 180.94788 Sputtering method DC Thermal conductivity 57 W/m.K Thermal expansion coefficient 6.3 x 10-6 /K Size OD: 20~300mm Wall thickness: ≥ 0.5mm Application of Ta Rotating Target...

Brand Name:Mittel

Model Number:molybdenum rods

Place of Origin:China

... luster Standard ASTM B387 Application Electric light source parts, heat shield, heat bodies in high temperature furnaces, sputtering target, and medical facilities, etc. Type and Size Type Swaged Rods Straightened Rods after Drawn Ground or

Brand Name:TK NANO

Model Number:0.5-3MM

Place of Origin:China

...target Molecular weight: 60.08 Appearance: white Melting point: 1700℃ Density: 2.2-2.7g/cm3 In 10-4Torr vacuum evaporation temperature is: 1025℃ Transparent area /nm:200-8000 Relative dielectric constant: 3-4 Breakdown voltage /V? Cm-1:106 Thickness:0.03-0.3μm Deposition technology: reactive sputtering