100 40mm metal sputtering target

Brand Name:Changsheng

Place of Origin:China

Model Number:Ti,Ti-Al, Zr, Cr. etc.

Description Sputtering targets are materials from which thin films are grown by a sputtering method. These targets are fabricated by processing metals or ceramics. We offer sputtering target products in a wide range of materials, purities, and shapes by ...

Brand Name:LHTi

Model Number:Titanium Target

Place of Origin:Baoji, Shaanxi, China

Metal Sputtering Targets Gr1 Gr2 Gr5 Titanium Sputtering Silver Sputtering Target For PVD Vacuum Coating Machine Product Details: Grade: Gr1 Gr2 Gr5 Titanium ,TiAl, TiCr, TiCu,TiSi,Mo,Cr etc. As customers' requests Size: 60/65/70/80/85/90/95/100(D)/200/300/400×20/30/32/35/40/42/45/50(T) Or as customers' requests Surface: bright surface Application: Coating industry, sputtering...

Brand Name:JINXING

Model Number:Zirconium Sputtering Target

Place of Origin:China

High Purity Metal Sputtering Targets Zirconium is an active metal with a great affinity for oxygen, and the excellent corrosion resistance of the oxide film determines that it can be competent in multiple corrosive environments. 3. Zirconium has good ...

Brand Name:FGD

Model Number:fgd t-002

Place of Origin:China

Ultra high purity tungsten alloy W-Ti sputtering target Plate Planar Billet for Semiconductor Physical Vapor Deposition Tungsten-titanium (WTi) films are known to act as the effective diffusion barrier between Al and Si in semiconductor and photovoltaic ...

Brand Name:GNEE

Model Number:TiP0001

Place of Origin:Henan

Pure Titanium 99.99% 4n Disc High Purity Ti Metal Sputtering Target Titanium is metallic and ductile. Sound travels at a rate of 5,090 m/s. The main characteristics of titanium are low density, high mechanical strength and easy processing. The ...

Brand Name:PRM

Model Number:Custom

Place of Origin:China

... DIA 100*40MM Round Titanium Sputtering Target For Vacuum Coating Shape round/Square according to your request Density ≥4.51g/cm³ Type As per customers' requirement Standard ASTM F67,ASTM F136 ASTM B381 Size Diameter 100mm ,thickness 40mm Surface Bright...

Brand Name:ZG

Model Number:MS

Place of Origin:CHINA

... , Compound , and various ceramic target , such as Oxide , Nitride , Carbide , Boride , Sulfide , Selenide and Telluride sputter target .We provide a complete line of sputtering target materials suitable for Pulsed Laser Deposition ( PLD ) systems and

Model Number:Tungsten Sputtering Target

..., smelting equipment, petroleum, etc PARAMETER OD(mm) ID(mm) Length(mm) Custom Made 140-300 120-280 100-3300 Model Number W1 Shape customized Chemical Composition 99.95% W Feature (1) Smooth surface without pore,sporesch and o

Categories:oxide metal and others targets

Country/Region:china

Nickel Oxide (NiO) Sputtering Target Purity--- 99.9% Denstiy---7.45g/cm3 Refractive Index---2~2.1 Melting Point ---1410℃ Transparence Wave Band----0.52 um Shape---Discs, Plate,Step (Dia ≤200mm,, Thickness ≥1mm) Rectangle, Sheet, Step (Length ≤300mm, Width...

Brand Name:HMD

Model Number:HMD-Nb

Place of Origin:CHN

... is a soft, ductile transition metal which is resistant to corrosion due to the presence of an oxide layer on its surface. It is one of the most common elements found in the Earth’s Crust. It is often found in the pyrochlore mineral. Uses of Niobium It

Brand Name:Feiteng

Model Number:Titanium tube target

Place of Origin:Baoji, Shaanxi, China

Titanium Tube Target Titanium Gr2 ASTM B861-06 a 133OD*125ID*2140L Vacuum Coating Target Item name Titanium tube target Size φ133*φ125*2140 Grade Gr2 Packaging Wooden case Port of place Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port...

Brand Name:TK MATERIAL

Model Number:99.99%

Place of Origin:China

Target name: aluminum target Common Purity: 99.9% (3N) 99.99% (4N) 99.999% (5N) 99.9999% (6N) Common dimensions: 100*40mm Maximum size: long 3000mm

Model Number:Customized

Place of Origin:China

Brand Name:Sanhui

..., lustrous, hard, and brittle metal known for its high mirror polish and corrosion resistance. It has a melting point of 1,857°C, a density of 7.2 g/cc, and a vapor pressure of 10-4 Torr at 1,...

Brand Name:Sifon

Model Number:5mm*W*L

Place of Origin:China

...wide application, our targets are widely accepted by customers. 5. we offer the service that if you finished useing the target, send them back to us, and we will pay. Molybdenum targets are our best advantaged products. We can make as big dimension as T

Brand Name:Lion King

Place of Origin:Guangdong

... are cleaned via ion bombardment and heated.​ 3.Sputtering Process: Argon gas is injected into the chamber; high voltage ionizes argon into plasma. Under the action of a strong magnetic field, plasma ions are accelerated to bombard the sputtering target,

Brand Name:MH

Model Number:MHT7263

Place of Origin:Baoji,China

...Target For Medical / Industrial Coating Specification: Item Name GR1 GR2 GR5 Titanium Alloy pvd Targets/Titanium Sputtering Targets for coating Material Titanium (Gr1, Gr2, Gr5, Gr7,GR12) Alloy target: Ti-Al, Ti-Cr, Ti-Zr etc Standard ASTM B381; ASTM F67, ASTM F136 size 1. Ø30--2000mm, thickness 3.0mm--300mm; 2. Plate Targe: Length: 200-500mm Width:100-230mm Thickness:3--40mm...

Brand Name:JXS

Place of Origin:China

...Sputter deposition is a physical vapor deposition (PVD) method of thin film deposition by sputtering. This involves ejecting material from a "target" that is a source onto a "substrate" such as a silicon wafer. Resputtering is re-emission of the deposited material during the deposition process by ion or atom bombardment. Sputtered atoms ejected from the target have a wide energy distribution, typically up to tens of eV (100...