99 95 ion implantation in semiconductors

Brand Name:JINXING

Model Number:Ion Implanting Molybdenum Products

Place of Origin:CHINA

99.95% Ion Implanting Molybdenum Products In Precision Components Application Ion Implanting Molybdenum Products are an ion beam technology that ionizes the atoms of an element into ions, accelerates them at a voltage of tens to hundreds of kV, and injects them into the surface of workpiece material placed in vacuum target chamber after obtaining high speed. After ion implantation...

Brand Name:Sanhui

Model Number:W1

Place of Origin:China

99.95% Tungsten Custom Processing Semiconductor Ion Implantation Accessories Tungsten Ion implantation parts are a new generation of high technology for material surface treatment. Ion implantation is a low-temperature process through which the ions of an element are accelerated into a solid target, thereby changing the physical, chemical or electrical properties of the target. Ion implantation is used in semiconductor...

Model Number:Tungsten Rod Bar

99.95% Purity Tungsten Rod 2.4 Mm For Ion Implantation Parts Tungsten Rod is made of tungsten billet through hot rolling, leveling, and cold rolling. Strips, rods, and other pure tungsten profiles. Tungsten has a high melting point, high-temperature ...

Brand Name:Forged

Model Number:W-1

Place of Origin:Luoyang

Applications: used in electronic, electric light source, electric vacuum and other industries. making up tungsten electronic board, tungsten boat, tungsten target material, tungsten heat insulation screen, tungsten heating element and other products, ion ...

Brand Name:WPVAC

Model Number:JPK-2-WP

Place of Origin:CHINA

Typical application for Relays: vacuum relays play a vital role when high power and low RF losses are required. • Vapor Deposition For Semiconductor Wafer Processing • Radio Antenna Tuning Matching Circuits • T/R Switches • Pulse Forming Networks • Ion ...

Brand Name:ZG

Model Number:MS

Place of Origin:CHINA

... chemical resistance and low thermal expansion. Multi-bore Alumina Tubes are used to make parts for CVD, ion implants, photolithography, and semiconductor. Specifications of Multi-bore Alumina Tubes Size OD: 1~100 mm Material Al2O3 Purity 99%-99.8% Density