silicon dioxide sputtering target

Brand Name:ZCQ

Model Number:ZCQ

Place of Origin:China

Silicon Dioxide Sputtering Target By Chinese Manufacturers Factory Chemical formula:SiO2 Molar mass:60.08 g/mol Density:2.648 (α-quartz), 2.196 (...

Brand Name:JINXING

Model Number:Aluminum Silicon Sputtering Target

Place of Origin:China

...Silicon Sputtering Target (AlSi) alloy 90:10/ 80:20 at% After the development of sputtering coating technology in recent years, the coating technology for various materials has been very perfect. Jinxing company provides a full range of sputtering coating targets (including metal targets, alloy and intermediate alloy targets, ceramic targets...

Brand Name:LHTi

Model Number:Titanium Target

Place of Origin:Baoji, Shaanxi, China

...our daily life. In the sputtering deposition process, the coating material is bombarded by the electron beam or ion beam, just like the target is hit, so the material used in the sputtering process is called the "sputtering target". From metal titanium to

Brand Name:QUALITY METALS

Model Number:CDX--TB-2021020

Place of Origin:China

...Sputtering Target High Purity 99.995% Circular Ti Titanium Sputtering Target Titanium sputtering target PVD coating Grade 1 Titanium Arc Target Ti Target titanium sputtering target​ 99.9% Tiox Titanium Oxide Rotary Target sputtering target Pvd vacuum coating Titanium Oxide TIOX Sputtering Target high purity GR1 sputtering titanium target ★ Material Titanium Gr. 1 Key words Titanium sputtering target Titanium sputtering

Brand Name:Sanhui

Model Number:Mo1

Place of Origin:Henan, China

...Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 Ground Rolling The molybdenum sputtering target has the characteristics of high purity, high density and fine grain, so that the sputtering efficiency, uniform film thickness and smooth etching surface are obtained in sputtering. There are two kinds of molybdenum sputtering

Categories:Metal Sputtering Target

Country/Region:china

... that the target stays in place during the sputtering process, resulting in a high-quality output. The Metal Sputtering Target is made with 99.99% purity, ensuring that it is free from impurities that may affect the quality of the output. This makes it

Brand Name:Feiteng

Model Number:Titanium tube target

Place of Origin:Baoji, Shaanxi, China

...Target Pure>3N5 127*458*10 Chromium Sputtering Target Item name Chromium Plate target Size OD127*ID458*10 Pure Pure>3N5 Packaging Vacuum package in wooden case Port of place Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port Related product magnetron sputtering target Rotary Target ito rotary target Titanium Rotary Target Vacuum Package Rotary Target titanium sputtering target Vacuum Coating Target...

Brand Name:ZG

Model Number:MS

Place of Origin:CHINA

... , Compound , and various ceramic target , such as Oxide , Nitride , Carbide , Boride , Sulfide , Selenide and Telluride sputter target .We provide a complete line of sputtering target materials suitable for Pulsed Laser Deposition ( PLD ) systems and

Categories:Molybdenum Products

Country/Region:china

... Sputtering Target Molybdenum Sputtering Target 10.2g/Cm3 Molybdenum Plate 10.2g/Cm3 Send Email Inquiry Now Molybdenum Sputtering Target Description In the electronics industry molybdenum sputtering targets are mainly used for flat panel displays,

Model Number:HF205

Place of Origin:China

Brand Name:SKYHIL

...Silicon Dioxide CAS No.:7631-86-9 Used For Rubber Product Description: The silicon dioxide used in toothpaste is the powder without fixed model. No smell, no dissolved in water and acid, no chemical reaction with other chemical element, compatible with the fluorid and other materials of toothpaste are the features of this sort of silicon dioxide. Specifications of Silicon Dioxide...

Brand Name:PRM

Model Number:custom

Place of Origin:China

... from molybdenum powder. In most cases, it is made from the anode itself, which is sintered molybdenum powder, and the target is formed by the anode. Anodes can be stationary or rotating anodes. Other standard methods, chemical vapor deposition, or again,

Brand Name:TORICH

Model Number:304L

Place of Origin:China

Torich 133*4*4113mm 304L Planar Sputtering Target Sputtering Target Stainless Steel Tube Torich 133*4*4113mm 304L Sputtering Target Stainless Steel Tube Grade:304L Specification: 133*4*4113mm Tolerance of OD:0.1-0.4mm Tolerance of ID:124.5-125.2mm ...

Brand Name:PRM

Model Number:custom

Place of Origin:China

Molybdenum Copper Alloy Magnetron Sputtering Target 1. Description of Molybdenum Copper Alloy Magnetron Sputtering Target: The preparation of molybdenum-copper alloy magnetron sputtering targets is mainly by infiltration method. First, molybdenum powder...

Brand Name:Sunhere

Model Number:CD1\CD2\CD3

Place of Origin:CHINA

..., fundamentally solve the product caking. CAS No.:14464-46-1 Comply with GB 25576-2010 Item Food Additives Silicon Dioxide (national standard GB 25576-2010) Identification Conforms Loss on drying ≤5.0% Loss on igntion ≤8.5% Heavy metals ≤30mg/kg ...

Brand Name:FGD

Model Number:fgd t-002

Place of Origin:China

...sputtering target Plate Planar Billet for Semiconductor Physical Vapor Deposition Tungsten-titanium (WTi) films are known to act as the effective diffusion barrier between Al and Si in semiconductor and photovoltaic cells industry. WTifilms are typically deposited as thin films by physical vapor deposition (PVD) through sputtering of a WTialloy target. It is desirable to produce a target...

Brand Name:TK NANO

Model Number:0.5-3MM

Place of Origin:China

...target Molecular weight: 60.08 Appearance: white Melting point: 1700℃ Density: 2.2-2.7g/cm3 In 10-4Torr vacuum evaporation temperature is: 1025℃ Transparent area /nm:200-8000 Relative dielectric constant: 3-4 Breakdown voltage /V? Cm-1:106 Thickness:0.03-0.3μm Deposition technology: reactive sputtering

Brand Name:HMD

Model Number:NONE

Place of Origin:CHN

...Sputtering Target plate sheets Product Description - uniform grain with densified microstructure ensures longer use time. - High special strenghth, high melt point - excellent corrosive resistance, good thermal resistance. - professional after-sales service Commodity Name Pure molybdenum sputtering target...

Brand Name:AAREAL

Model Number:AX

Place of Origin:China

... flow-thru vibro Screen machine for silicon dioxide powder is a powerful high-efficient machine that compacts high capacity scalping for both wet and dry materials. This new type of machine ...