sputtered zirconium target

Brand Name:JINXING

Model Number:Zirconium Target

Place of Origin:China

... field because of the high purity, fine grain sizes, homogeneous microstructure, excellent surface condition and accurate dimensions. Zirconium Cylindrical Sputtering Target Description We offer a wide range of ceramic and metallic sputter targets,in

Brand Name:PRM

Model Number:Custom

Place of Origin:China

...Zirconium Target Titanium Zirconium Alloy Sputter Coating Target Material Zirconium & Zirconium alloy Grade Zr702,Zr704,Zr705,RO60001,RO60901,RO60804 etc. Purity >99.5% Density 6.51g/cm3 Standard ASTM B550 Size According to your demand Shape Round disc/target...

Brand Name:FGD

Model Number:fgd Z-001

Place of Origin:China

Specification Magnetic control Sputtering Optic Lens Cover plate/Cover glass Colour Target Plane

Brand Name:Feiteng

Model Number:Zirconium Target

Place of Origin:Baoji, Shaanxi, China

Zirconium Target Target Materials Titanium Zr702 100OD*40 Product Zirconium target Size φ100*40 mm Grade Zr702 Packaging Wooden case Port of delivery Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port Zirconium alloy a non-ferrous alloy consisting of zirconium as a matrix and the addition of other elements. The main alloying elements are tin, niobium, iron, etc. Zirconium...

Categories:oxide metal and others targets

Country/Region:china

...zirconium target Purity 99.95% Shape Flat target, according to your request Available size Round: dia 25~550mm, Thickness:3~30mm Rectangular: Length up to 2000mm Customization is available Technics Hot isostatic pressing Application Widely used in coating processing industries A: Decoration and mould field. etc. Detailed information Zirconium...

Brand Name:Sifon

Model Number:tungsten target

Place of Origin:China

Sputtering Tungsten Targets Close Grain For LCD Panel 1. Product Details: 1. high purity, ≥99.95% 2. high density, 99% or higher 3. O content less than 20ppm It's widely used in aerospace industry, rare earth industry, chemical equipment area, medical equipment area, melting equipment, oil industry etc. Tungsten targets are our advantaged products. They are covering the target to protect the surface of the target. We can also bonding the target

Categories:Metal Sputtering Target

Country/Region:china

... of thin films and coatings. Additionally, our targets have a Purity level of 99.99%, ensuring that the deposited films and coatings have a high level of purity and quality. Our Metal Sputtering Targets are available in a range of thicknesses, from 10...

Place of Origin:china

Brand Name:BAOJITST

Model Number:45

Zirconium Target Zir702 Purity 99.95%above Size Dia100mm x Height MOQ 10kgs

Brand Name:LHTI

Model Number:Ta target

Place of Origin:China

... target, thickness x width x length = 5 ～ 25x≤800x≤2000 (mm) Grain size: Recrystallization degree ≥98%, average grain size <...

Place of Origin:Baoji, China

Brand Name:HUAHENG TITANIUM

99.5% Zirconium TargetShaped inCylinder 1.Product name:Highpurity ZirconiumTargets 2.Purity:Zr+Hf>99.95%, Hf<300ppm. 3.Confirmation:ISO9001:2008certified 4.Standard:GB/TORASTM 5.Trace Elements Grade Main Elements(ppm,max) Hf Nb Mo Cr Al Ti Mn Ni Zr+Hf>99....

Brand Name:KYKY

Model Number:SBC-12

Place of Origin:China

Ion Sputtering instrument , SBC-12 , Target available for Au , Ag , Cu , Al This device is primarily designed for coating of conductive films on SEM samples.Easy operation, cost-effectiveness, androbust durability, making it an indispens able tool for ...

Brand Name:HMD

Model Number:HMD-ZR

Place of Origin:CHN

...Zirconium R60702/R60705 Wires, Coils for Industrial Use Product Description We provides other zirconium and zirconium alloy products, such as Zirconium rod, Zirconium sheets, Zirconium foil, Zirconium tube, Zirconium flange, Zirconium Pellets, Zirconium Ring, Zirconium Spring, Zirconium plate, Zirconium bar, Zirconium Crucible, Zirconium Flange, Zirconium sputtering targets, Zirconium pipe fittings, other machined and tailor-made zirconium

Place of Origin:China

Zr/Zirconium sputtering target Available purity: 99.5%,99.9% Dimension: As per your request Available shape: round, rectangle Density: 6.508g/cm3 Melting point: ...

Place of Origin:Guangdong

Brand Name:Lion King

...Sputtering Chamber Size Can Be Customized According to Details Requirement Application Sanitary Ware, Car Wheel, Hard Ware, Cutleryetc Coating Color Golden, Rose Gold, Black, Blue, Rainbow Color, etc Coating Film Tin, Tic, Ticn, Tialn, Crn, Cu, etc Sputtering Target Titanium, Chrome, Zirconium...

Brand Name:Sanhui

Model Number:Mo1

Place of Origin:Henan, China

... There are two kinds of molybdenum sputtering targets:molybdenum planar target and molybdenum rotary target. Molybdenum sputtering target is one kind of industrial material, which is widely used in conductive glass, STN / TN / TFT-LCD, optical glass,

Model Number:Tungsten Target

... spectrometry (GDMS), and inductively coupled plasma (ICP); 2. Tungsten target from Achemetal is provided with high purity up to 99.97%, density 18.8-19g/cm3, homogeneous organization structure, and fine grain; 3. Our tungsten sputtering target has been

Brand Name:ZCQ

Model Number:ZCQ

Place of Origin:China

High temperature resistant high quality fused silica sputtering target Silicon dioxide sputtering target contains Si and O. Silicon dioxide (SiO2), also known as Silica, is a natural compound made from two of the most abundant materials on the planet: ...

Brand Name:ZG

Model Number:MS

Place of Origin:CHINA

... , Compound , and various ceramic target , such as Oxide , Nitride , Carbide , Boride , Sulfide , Selenide and Telluride sputter target .We provide a complete line of sputtering target materials suitable for Pulsed Laser Deposition ( PLD ) systems and

Brand Name:JXS

Place of Origin:China

...Sputter deposition is a physical vapor deposition (PVD) method of thin film deposition by sputtering. This involves ejecting material from a "target" that is a source onto a "substrate" such as a silicon wafer. Resputtering is re-emission of the deposited material during the deposition process by ion or atom bombardment. Sputtered atoms ejected from the target...