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| Categories | Metal Sputtering Target |
|---|---|
| Brand Name: | APG |
| Place of Origin: | china |
| Certification: | ISO9001、ISO14001、ISO45001、IAFT16949 |
| Packaging Details: | Vacuum-sealed packaging, case-packed for storage and transport |
| Delivery Time: | 4-5 weeks |
| Payment Terms: | T/T |
| Supply Ability: | Stable supply |
| Purity: | 99.9%-99.99% |
| Density: | 13.31 g/cm³ |
| Name: | Hafnium Target (Hf) |
| Forming Process: | Hot Pressing Sintering |
| Product Specifications: | Flat target, Rotating target |
| Application Fields: | Semiconductor Manufacturing, Optical Device Manufacturing. Nuclear Industry, Aerospace and High-Temperature Protection |
| Company Info. |
| Shenzhen APG Material Company Limited |
| Verified Supplier |
| View Contact Details |
| Product List |
Hafnium targets are sputtering targets made from high-purity hafnium metal (Hf), featuring a high melting point (~2227℃), excellent corrosion resistance, good ductility, and outstanding thermal neutron absorption. They are widely used in semiconductor manufacturing, optical coatings, nuclear industry, and high-temperature alloys. Hafnium is a critical strategic material in the electronics and energy industries, especially for advanced chip processes and nuclear reactors.
>l >Ultra-high Melting Point and Thermal Stability
Maintains structural stability in high-temperature environments, suitable for high-temperature coating processes and extreme conditions.
>l >Excellent Corrosion Resistance
Highly resistant to most acids, bases, and chemical media, enabling long-term use in harsh environments.
>l >High purity and superior film performance
Sputtered films are uniform and dense; hafnium compounds (e.g., HfO₂) have low absorption in the UV optical range, making them ideal high-refractive-index materials for semiconductors and optical coatings.
>l >Key role in advanced semiconductor processes
Hafnium compounds (e.g., HfO₂) are core high-k dielectric materials, widely used in advanced logic devices and memory chips to improve integration and reduce power consumption.
Applications of Hafnium Targets
>l >Semiconductor Manufacturing
Hafnium targets are essential for producing high-k dielectric films, such as HfO₂, extensively used in advanced logic devices, MOSFETs, and DRAM memories. Their high-k properties effectively reduce device leakage current and enhance integration and performance, making them indispensable for 7nm and more advanced processes.
>l >Optical Device Manufacturing
Hafnium targets are used to produce high-refractive-index HfO₂ films in optics, applied in laser optical systems, interference filters, infrared windows, and precision lenses. These films enhance the optical transmittance and high-temperature resistance, meeting the strict quality requirements of high-end optical systems.
>l >Nuclear Industry
Sputtered films can be used in reactor control systems and protective structures due to hafnium's extremely high neutron absorption cross-section. Hafnium coatings play a critical role in nuclear safety and are irreplaceable functional materials in the nuclear field.
>l >Aerospace and High-Temperature Protection
Hafnium targets are used to create high-temperature oxidation-resistant coatings for jet engines, gas turbine blades, and other high-temperature components. Their high melting point and chemical stability ensure reliability in extreme aerospace environments, extending overall system lifespan.
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